Sheet Resistance Unit - ± 10% of nominal value: Web sheet resistance/resistivity is the resistance of a square of the conductive thin film with uniform thickness. Resistance drift (1,000 hr at 150°c in air) <1,000 ppm: The measurement unit typically used is ω/square. The number of squares is determined by the layout and is specified by the ic designer. −75±50 ppm/°c (typical), 0±25 ppm/°c with vacuum anneal: Resistor tolerance after anneal and laser trim: The sheet resistance is measured using the van der pauw technique with example test structures as shown in figure 2. Tcr tracking * <2 ppm:
EE143 S06 Lecture Sheet Resistance Rs R p WIt
Resistance drift (1,000 hr at 150°c in air) <1,000 ppm: Tcr tracking * <2 ppm: ± 10% of nominal value: The measurement unit typically used is ω/square. −75±50 ppm/°c (typical), 0±25 ppm/°c with vacuum anneal:
EE143 S06 Lecture Sheet Resistance Rs R p WIt
± 10% of nominal value: −75±50 ppm/°c (typical), 0±25 ppm/°c with vacuum anneal: Resistance drift (1,000 hr at 150°c in air) <1,000 ppm: Resistor tolerance after anneal and laser trim: The sheet resistance is measured using the van der pauw technique with example test structures as shown in figure 2.
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−75±50 ppm/°c (typical), 0±25 ppm/°c with vacuum anneal: Resistance drift (1,000 hr at 150°c in air) <1,000 ppm: ± 10% of nominal value: Web sheet resistance/resistivity is the resistance of a square of the conductive thin film with uniform thickness. Resistor tolerance after anneal and laser trim:
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The number of squares is determined by the layout and is specified by the ic designer. Web sheet resistance/resistivity is the resistance of a square of the conductive thin film with uniform thickness. Resistance drift (1,000 hr at 150°c in air) <1,000 ppm: The measurement unit typically used is ω/square. −75±50 ppm/°c (typical), 0±25 ppm/°c with vacuum anneal:
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The measurement unit typically used is ω/square. Tcr tracking * <2 ppm: ± 10% of nominal value: The sheet resistance is measured using the van der pauw technique with example test structures as shown in figure 2. Resistor tolerance after anneal and laser trim:
EE143 S06 Lecture Sheet Resistance Rs R p WIt
Resistance drift (1,000 hr at 150°c in air) <1,000 ppm: −75±50 ppm/°c (typical), 0±25 ppm/°c with vacuum anneal: The sheet resistance is measured using the van der pauw technique with example test structures as shown in figure 2. Web sheet resistance/resistivity is the resistance of a square of the conductive thin film with uniform thickness. The number of squares is.
Electronics Free FullText Sheet Resistance Measurements of
The sheet resistance is measured using the van der pauw technique with example test structures as shown in figure 2. Web sheet resistance/resistivity is the resistance of a square of the conductive thin film with uniform thickness. The number of squares is determined by the layout and is specified by the ic designer. Resistor tolerance after anneal and laser trim:.
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Resistance drift (1,000 hr at 150°c in air) <1,000 ppm: Resistor tolerance after anneal and laser trim: ± 10% of nominal value: Tcr tracking * <2 ppm: The number of squares is determined by the layout and is specified by the ic designer.
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−75±50 ppm/°c (typical), 0±25 ppm/°c with vacuum anneal: The number of squares is determined by the layout and is specified by the ic designer. Resistance drift (1,000 hr at 150°c in air) <1,000 ppm: ± 10% of nominal value: Web sheet resistance/resistivity is the resistance of a square of the conductive thin film with uniform thickness.
SURAGUS Information on Sheet Resistance Measurement
Tcr tracking * <2 ppm: The number of squares is determined by the layout and is specified by the ic designer. Resistor tolerance after anneal and laser trim: ± 10% of nominal value: The measurement unit typically used is ω/square.
Resistance drift (1,000 hr at 150°c in air) <1,000 ppm: The number of squares is determined by the layout and is specified by the ic designer. ± 10% of nominal value: Web sheet resistance/resistivity is the resistance of a square of the conductive thin film with uniform thickness. The measurement unit typically used is ω/square. Resistor tolerance after anneal and laser trim: The sheet resistance is measured using the van der pauw technique with example test structures as shown in figure 2. −75±50 ppm/°c (typical), 0±25 ppm/°c with vacuum anneal: Tcr tracking * <2 ppm: